Biography: Andrea Kneidinger is Business Development Manager at EV Group, where she focuses on Micro- and Nanoimprint Lithography for a variety of applications, in particular nanophotonics and wafer level optics.Andrea received the master´s degree (M.Eng) from the Deggendorf Institute of Technology and Budapest University of Technology and Economics where she studied "Technology and Innovation Management". She has several years of professional experience in electrical engineering as well as product management -  especially in materials, optics and photonics.

      Abstract: Wafer-level nanoimprint lithography (NIL) has increasingly become a key enabling technology supporting new devices and applications across the photonic industry. Leading manufacturers of optical sensors, augmented reality (AR) devices and biomedical chips are already utilizing NIL and realizing the benefits of this technology, including the ability to cost-effectively mass manufacture micro- and nano-scale structures.

      Biography: DR.JI RAN, Chairman and Founder of QingDao GERMANLITHO CO., LTD. He has a master's degree from RWTH Aachen University in Germany and a doctorate from Max Planck Institute of Microstructure Physics in Germany. Under the tutelage of Professor Kurz, the father of European nanoimprint, he pioneered the commercial field of nanoimprint equipment and materials, in the fields of nanoimprint and micro-nano processing Has twenty years of experience. After graduating from his doctorate, he was responsible for the development and industrialization of nanoimprint equipment in a German semiconductor equipment listed company, and served as the chief scientist of nanoimprint technology. In 2015, he returned to China and founded QingDao GERMANLITHO CO.,LTD. After just a few years of development, the company’s nanoimprint equipment and complete solutions defeated many international competitors and Occupy more than 90% of the domestic market share of micro-nano optics and biochip production.

      Abstract: With the gradual maturity of nanoimprint technology, more and more applications have been applied in the field of micro-nano optics in recent years, such as diffractive optical elements DOE, micro lens arrays, AR waveguide gratings, etc.The application fields of micro-nano optical components are very wide, such as 3D sensing, AR glasses, fingerprint recognition under the screen, mobile phone cameras, high-end lighting, spectrometers, medical equipment, etc.GremanLitho Co., Ltd.'s nanoimprint technology provides a complete solution for nanolithography with a precision better than 20 nanometers and an aspect ratio of 10:1 on a 12-inch area, which can be widely used in the production of micro-nano structure products.

      Biography: Dr. Liu Ze, professor of Wuhan University. He obtained his bachelor's degree from Harbin Institute of technology in 2007, and doctor's degree from Tsinghua University in 2012. After the postdoctoral research at Yale University, he joined as a faculty at Wuhan University in 2015. His research field is micro/nano manufacturing and surface/interface science. He has published more than 70 academic papers, applied for and authorized more than 10 invention patents, and won the second prize of National Natural Science of China in 2017. His main academic achievements are: First report the almost "zero" friction (i.e., structural superlubricity) motion at microscale and in air condition; Invent a superplastic deformation based technology to directly shape crystalline metals on the nanoscale and large area.

      Abstract: Sensors are the bottom layer and the forefront of the Internet of things. At present, the mature sensors are mainly based on silicon microfabrication technology. With the trend of miniaturization of sensors, high-performance new material sensors developed in the laboratory are often trapped by low-cost and precision manufacturing technology for application. The reporter will show progress of his research group in the field of metal (alloy) forming based micro/nano manufacturing, including the development of superplastic nanomolding technique, the underlying mechanism and some application.

      Biography:  Dr. Kehan Tian has been long engaged in the latest researches in micro-nano diffractive optical electrical (DOE), 3D optical measuring system and precision manufacturing of semiconductor. He obtained his Bachelor’s degree and Master’s degree from Tsinghua university and then he studied in Massachusetts Institute of Technology (MIT) where he was obtained his Doctor’s degree. After his graduation, he became a Senior Scientist / Researcher (Professor-level) at the TJ Watson Research Center and Semiconductor R&D Center of IBM in the US. He returned to China and started Uphoton Technology, focused on the R&D and commercialization of micro-nano diffractive optical devices and 3D sensors, to provide customized total solutions that are widely applied in smart 3D sensing and recognition, machine vision, AR/VR, smart security and protection system, auto-driving and other fields.

      Abstract: Along the development of semiconductor technologies, micro-nano optics has seen wide applications in a variety of fields including consumer electronics, security and protection, car borne devices, etc., in particular AR and 3D. The speech will mainly be talking about the micro-nano optics industrialization research as well as the latest progress in these fields.

      Biography: 

      Abstract: Metallic glass with advantages of high strength, high precision, high surface finish and easy machining and forming. Through the precise controllable temperature rise system and rapid cooling system, the micro-nano precision thermal coupling molding of different materials can be realized under the ultra-high vacuum and high temperature environment.

The research results mainly include:

1. New amorphous alloy micro-nano manufacturing and molding equipment

The equipment has the advantages of high efficiency and good stability, which can greatly improve the thermoplastic forming efficiency and forming accuracy of amorphous alloy.

2. Thermal coupling manufacturing technology of amorphous alloys.

The technology includes the selection and design of the material system, the precise control of the process parameters and the radial limit technology, which can effectively avoid the influence of the adverse phenomena such as crystallization and oxidation of amorphous alloy at high temperature.

      Biography: 

      Abstract: The presentation introduces the prospect research, innovation and application of micro-nano intelligent manufacturing.

The photonics, optics and display industry have been developed rapidly in past decade of the century. There are great demands on micro/nano manufacturing which is the fundamental path to promote the innovation of the metaverse, planar imaging and flexible meta-material industries.

The essential issue of micro/nano intelligent manufacturing is the digitization of light field, patterning, and replication capabilities. After years of efforts, our team has established a Micro/nano Intelligent Manufacturing Platform(MNIMP) on the large-format substrates. The bottleneck of real-time processing algorithm for massive data of 100Tb, digital patterning   and flexible micro/nano-replication with smart-identification has been broken through based on the  digital UV 3D lithographic equipment with network computing system and roll-to-roll multi-layer-alignment nanoimprinting lithography equipment. The MNMIP enables the further innovation of glasses-free 3D display, augmented reality(AR), planar imaging devices and flexible metamaterials, and is becoming a powerful engine for optoelectronics, light-field computation imaging, and the metaverse.

      Biography: 

      Abstract: Originating from nanoimprint process, nanoimprint technology modulated by structured-fields is believed as a novel technology which could replicate multiscale structures from submicron to sub-10nm. In order to meet the requirements of nanoscale features and three-dimensional micro/nano structures as well as multi-materials, nanoimprint technology modulated by structured-fields is developed. Modulated by structured fields, the gradient distributions of multi-materials and their structures could be achieved with nearly zero imprinting force, ensuring the high-fidelity replication. This technology breaks through the limitations of half wavelength effect in traditional lithography, and open up the development of micro/nano device manufacturing with material-structure integration, which could promote the manufacturing of intelligent sensing, micro/nano sensors, generalized chips ,and etc.

      Biography:Feng Luo, Chair Professor, School of Materials Science and Engineering/School of Electronic Information and Optical Engineering, Nankai University Since 2021.Feng is currently a chair professor of School of materials science and engineering of Nankai University and an adjunct chair professor of Xi'an Jiaotong University from 2018-2020. From 1995 to 2004, he studied at the school of chemistry and molecular engineering, Peking University, and received his bachelor's and doctor's degrees. From 2004 to 2009, he worked in Germany and Switzerland as a postdoctor, and from 2009 to 2010, he served as a Principle Investigator in the Collge of Engineering of Peking University. From 2010 to 2020, he worked in the IMDEA Nanoscience as a senior research Professor. He has been selected as a Marie Curie scholar of the European Union, the Spanish fund for Distinguished Young scholars, the Spanish I3 distinguished professor, etc. At present, he serves as a board member of the science and innovation commission of the Institute of Advanced Science Facilities，Shenzhen, the member of Shanghai Light Source User Committee.

      Abstract: A brief review over nanoimprinting technologies focused on micro/nano fabrication and ultra-precision manufacturing designed for semiconductor field

has been descried for patterning devices.

      Biography: Tao LI, Professor of Nanjing University (NJU). He was selected as the "Dengfeng Talent Program B" from NJU, won the "National Funds for Outstanding Young Scientists", "Young and middle-aged leading scientists" from MOST, and “K.C. Wong Education Foundation” scholarship. His research interest is about the micro/nano-photonics metamaterials, and photonic integration. Till now, he has published >100 papers with citation over 6000, presented >50 invited talks in international conferences and seminars. Now, he is working for Editorial Board of the Chinese Optics Letters, Science Bulletin, Advanced Devices & Instrumentation, etc.  

      Abstract: In recent twenty years, the development of nanofabrication brings the optics Science and technology into the nanoscale, which opens new advances and disruptive techniques in optics. Micro/nano-photonics emerges, among which optical metamaterial is one of the most promising directions. This talk will start from the most active topic of metasurface, as one branch of metamaterials, introduce the working principle, discuss the state-of-art of the metalenses and the challenges they face. Particularly, aiming to solve the long-standing difficulties in the imaging technologies like the chromatic aberration, small field-of-view (FOV), compact integration, etc., we propose a series of solutions based on the metalens technique, and prospect its application scenarios.

 Biography: Stella W. Pang is a Chair Professor and the Director of the Center for Biosystems, Neuroscience, and Nanotechnology of the Department of Electrical Engineering, City University of Hong Kong, China. She has over 400 technical articles, book chapters, and invited presentations. She has ten patents granted in nanotechnology and microsystems and four pending. Her research interests include nanofabrication technology for biomedical, microelectromechanical, THz and metadevices. Prof. Pang is a Fellow of IEEE, ECS, AVS, and HKIE. 

 Abstract: Various designs of nanostructures have been applied for high-performance biosensors and metadevices. To generate these nanostructures and the rest of the device components, fast, uniform, and reproducible nanotechnology will be needed. We have developed nanoimprint technology for various applications. With the proper stamps and materials to be imprinted, direct nanoimprint or reversal nanoimprint is achieved by controlling the surface energy of all the surfaces in contact. Multiple layers of nanostructures with the needed designs are stacked together to form three-dimensional (3D) devices with unique features and functions. In this presentation, 3D biosensors will be shown to detect cells and biomolecules with high sensitivity. Nanostructures are used to influence cell migration behaviors. Moreover, metasurfaces will be formed by nanoimprint. These metasurfaces will be incorporated in designs for high-frequency terahertz lenses and antennas, as well as to form chiral magic angles for light manipulation.

      Biography: Prof. Yifang Chen, B.Sc (Fudan University), M.Sc (SITP), D.Phil (University of Oxford), received his D.Phil degree in 1995 in Condensed Matter Physics in Oxford. He was a postdoctoral researcher in Delft University of Technology (1994-1996), Nanyang Technological University (1996) and University of Glasgow (1997-2002). He became a senior and then principal scientist in Rutherford Appleton Laboratory (2003-2012), visiting professor in École Polytechnique Fédérale de Lausanne (2010) and visiting senior scientist in National Physical Laboratory, UK (2016-2019). In 2012 he joined Fudan University through national high-end talent plan and received a special government allowance of the State Council in 2018. Dr. Yifang Chen has been dedicated in nanofabrication and applications since 1990, spanning electron beam lithography/nanoimprint lithography/dry-etch for nano-photoelectronic devices and chips, high electron mobility transistors (HEMTs), X-ray micro-optics, metasurface and nanophotonics, etc. Especially in the development of X-ray lenses for X-ray microscopes, he has led his research team achieve successes in manufacturing of key components and has developed a novel Kinoform lens with 15 nm resolution and high efficiency, which enables his research in the world leading position. He has published over 150 SCI papers and awarded 10 national patents in nanotechnology area. He is the associate editor of Microelectronic Engineering (Elsevier) and remote referee of European Research Council (ERC).

      Abstract: This talk reviews the technical developments of nanoimprint lithography (NIL) for the fabrications of nanolectronic devices, nanophotonic metamaterials and other nanostructures, conducted by the speaker’s group. Technical challenges and solutions in NIL such as nanofabrication of templates, removal of residual resist, pattern displacement in thermal NIL arising from thermal expansion are discussed. In the nanofabrication of templates, dry etch in plasma for the formation of multi-step structures and ultra sharp tip arrays in silicon, nanophotonic chiral structures with high aspect ratio in SiC are demonstrated. A bilayer technique for nondestructive removal of residual resist in thermal NIL is described. This process is successfully applied for the fabrication of T shape gates and functional high electron mobility transistors (HEMTs). The historical work regarding low temperature even room temperature NIL (RTNIL) on HSQ is also addressed, which successfully eliminated the pattern distortion caused by a thermal loop hot imprint process. A big variety of applications by low temperature UV-curing NIL in SU-8 are reviewed for the applications in high aspect ratio phase gratings, tagging technology, nanofluidic channels, nanophotonic metamaterials and biosensors, etc. All these technical developments laid a solid foundation for today’s industrialization applications.